铱靶材-高纯磁控溅射镀膜专用 Ir Target
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高纯贵金属磁控溅射镀膜铱靶材(Ir) Iridium铱靶 铱板 铱片材料

产品名称:

铱靶、铂靶、钯靶、银靶、铑靶

牌号规格:

Ir1、Pt1、Pd1、Ag1、Rh1

用途

主要用于磁记录介质、电子半导体、薄膜太阳能及平面显示等领域。

随着靶材在磁记录介质、电子半导体、薄膜太阳能及平面显示等产业的发展,我们加大在稀贵金属靶材研发和制备方面的投入力度,通过原料控制、真空感应熔炼、挤压、轧制、真空热压烧结、热等静压、放电等离子体烧结等不同工艺, 并采用严格的质量控制过程,我们能够制备多种靶材并能一直保持着批量供货。

公司在上海,江苏苏州,南京,北京,广东深圳,广州等地设有工厂及销售中心开展贵金属靶材业务,绑定服务,贵金属回收。

铱溅射靶材Iridium (Ir)

  规格尺寸:

形状

圆形、方形

尺寸

Φ50~170mm

厚度

3~15mm

纯度

≥3N5

注:具体尺寸请联系销售。

Iridium (Ir)Sputtering Targets

ChemicalFormula: Ir
CAS Number: 7439-88-5
Purity: 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Atomic Weight: 192.217
Atomic Number: 77
Color/Appearance: Silvery White, Metallic
Thermal Conductivity: 150 W/m.K
Melting Point (°C): 2,410
Coefficient of Thermal Expansion: 6.4 x 10-6/K
Theoretical Density (g/cc): 22.42
Z Ratio: 0.129
Sputter: DC
Max Power Density* (Watts/Square Inch): 100
Type of Bond: Indium, Elastomer

Iridium

Iridiumis a chemical element originated from Iris, the Greek goddess of the rainbow.It was first mentioned in 1803 and observed by S. Tennant. The isolation waslater accomplished and announced by S. Tennant. “Ir” is the canonical chemicalsymbol of iridium. Its atomic number in the periodic table of elements is 77with location at Period 6 and Group 9, belonging to the d-block. The relativeatomic mass of iridium is 192.217(3) Dalton, the number in the bracketsindicating the uncertainty